DEEP REACTIVE ION ETCHING (DRIE) IS A CRITICAL FABRICATION SYSTEM REQUIRED FOR MANY NIST MISSION-CRITICAL DEVICES.
$1,159,638
| Recipient | KLA CORPORATION UEI MDYMRNJZ36U3 |
|---|---|
| Award ID | 1333ND21PNB680365 |
| Award amount | $1,159,638 |
| Award type | PURCHASE ORDER |
| Awarding agency | Department of Commerce — National Institute of Standards and Technology |
| NAICS | 334516 — ANALYTICAL LABORATORY INSTRUMENT MANUFACTURING |
| PSC | 6640 |
| Set-aside | Unrestricted |
| Start date | Sep 23, 2021 |
| End date | Apr 28, 2022 |
| Place of performance | — |
| Record updated | May 30, 2025 |
View the official award record
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